Semiconductor device and method of manufacturing the same

ABSTRACT

A semiconductor device may comprise a plurality of conductive lines and a plurality of contact plugs. The plurality of conductive lines may include a first conductive line a second conductive line. The plurality of contact plugs may include a first contact plug and a second contact plug. The first contact plug may have a first pillar portion and a first protruding portion protruding from a sidewall of the first pillar portion at a first depth, so as to be in alignment and contact with a sidewall of the first conductive line. The second contact plug may have a second pillar portion and a second protruding portion protruding from a sidewall of the second pillar portion at a second depth, so as to be in alignment and contact with a sidewall of the second conductive line.

CROSS-REFERENCE TO RELATED APPLICATION

The present application is a continuation application of U.S.application Ser. No. 15/401,673, filed on Jan. 9, 2017, which is acontinuation application of U.S. application Ser. No. 14/496,026, filedon Sep. 25, 2014, and claims priority to Korean patent applicationnumber 10-2014-0067598 filed on Jun. 3, 2014, in the Korean IntellectualProperty Office, the entire disclosure of which is incorporated byreference herein.

BACKGROUND 1. Technical Field

Various embodiments generally relate to a semiconductor device and amethod of manufacturing the same and, more particularly, to asemiconductor device including contact plugs and a method ofmanufacturing the same.

2. Related Art

There technology proposals relating to stacking memory cells oversubstrates in order to increase the degrees of integration withinsemiconductor devices. The memory cells stacked over the substrates maybe coupled to conductive patterns. The conductive patterns may bearranged over the substrates at different heights. In order toindependently apply an electrical signal to the conductive patternsarranged at different heights, contact plugs may be coupled to theconductive patterns. The conductive patterns may be patterned to form astepped structure to open contact regions of the conductive patterns,and the contact plugs may be coupled to the contact regions of theconductive patterns opened through the stepped structure.

However, errors may occur when the conductive patterns are patternedinto the stepped structure. For example, misalignment may occur betweenthe contact plugs and the conductive patterns due to these errors.

SUMMARY

In an embodiment, a semiconductor device (e.g. a memory device) maycomprise a plurality of conductive lines and a plurality of contactplugs. The plurality of conductive lines may include a first conductiveline and a second conductive line. The plurality of contact plugs mayinclude a first contact plug and a second contact plug. The firstcontact plug may have a first pillar portion and a first protrudingportion protruding from a sidewall of the first pillar portion at afirst depth, so as to be in alignment and contact with a sidewall of thefirst conductive line at the first depth. The second contact plug mayhave a second pillar portion and a second protruding portion protrudingfrom a sidewall of the second pillar portion at a second depth, so as tobe in alignment and contact with a sidewall of the second conductiveline at the second depth. The first and the second conductive lines maybe first and second word lines, respectively.

In an embodiment, a semiconductor device (e.g. a memory device) maycomprise a plurality of conductive lines and a plurality of contactplugs. The plurality of conductive lines may include a first conductiveline and a second conductive line. A first contact plug of the pluralityof contact plugs may have a first pillar portion and a first protrudingportion protruding from a sidewall of the first pillar portion at afirst depth, so as to be in alignment and contact with a sidewall of thefirst conductive line at the first depth. In addition, the first contactplug may have a second protruding portion protruding from a sidewall ofthe first pillar portion at a second depth, so as to be in alignment andcontact with a sidewall of the second conductive line at the seconddepth. The first and the second conductive lines may be first and secondselect lines, respectively.

In an embodiment, a semiconductor device (e.g. a memory device) maycomprise a plurality of conductive lines and a plurality of contactplugs arranged in a matrix format. The plurality of contact plugs mayinclude a plurality of first contact plugs arranged in a first row ofthe matrix format, and a plurality of second contact plugs arranged in asecond row of the matrix format. Each first contact plug has a firstpillar portion and a first protruding portion protruding from a sidewallof the first pillar portion, so as to be in alignment and contact with asidewall of a corresponding one of the conductive lines. Each secondcontact plug has a second pillar portion and a second protruding portionprotruding from a sidewall of the second pillar portion, so as to be inalignment and contact with a sidewall of a corresponding one of theconductive lines. The alignments and contacts between the contact plugsand the conductive lines may be made at different depths of thesemiconductor device.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are plan views illustrating a representation of a layoutof a semiconductor device according to an embodiment;

FIGS. 2A and 2B are cross-sectional views illustrating a representationof a contact region of a semiconductor device according to anembodiment;

FIG. 3 is a cross-sectional view illustrating a representation of aperipheral region of a semiconductor device according to an embodiment;

FIGS. 4A to 17C are views illustrating a representation of a method ofmanufacturing a semiconductor device according to an embodiment;

FIGS. 18A and 18B are a plan view and a cross-sectional viewillustrating a representation of a contact region of a semiconductordevice according to an embodiment;

FIGS. 19 and 20 are perspective views illustrating a representation ofcell structures of a semiconductor device according to embodiments;

FIG. 21 is a view illustrating the configuration of a representation ofa memory system according to an embodiment; and

FIG. 22 is a view illustrating a representation of the configuration ofa computing system according to an embodiment.

DETAILED DESCRIPTION

Hereinafter, various embodiments will be described in detail withreference to the accompanying drawings. The figures are provided toallow those with ordinary skill in the art to understand the scope ofthe embodiments. The present embodiments may, however, be embodied indifferent forms and should not be construed as limited to theembodiments set forth. Rather, these embodiments are provided so thatthis disclosure will be thorough and complete. In addition, theembodiments are provided to fully convey the scope of the description tothose skilled in the art.

Various embodiments may generally relate to a semiconductor devicehaving improved alignment of contact plugs and a method of manufacturingthe same.

FIGS. 1A and 1B are plan views illustrating a representation of a layoutof a semiconductor device according to an embodiment. Particularly,FIGS. 1A and 1B are plan views illustrating a representation of acontact region of the semiconductor device. More particularly, FIG. 1Ais a plan view illustrating a layer on which a selection line is formed,and FIG. 1B is a plan view illustrating a layer in which a word line isformed.

Referring to FIGS. 1A and 1B, the semiconductor device according to anembodiment may include horizontal layers stacked over a substrate (notillustrated). Each of the horizontal layers may include conductiveregions and sacrificial regions. Each of the horizontal layers may bearranged between interlayer insulating layers 111 illustrated in FIGS.2A and 2B. Conductive patterns including a selection line SL, a dummypattern DP, and a word line WL may be formed in the conductive regions.Sacrificial insulating layers 113 (see FIG. 2A) may be formed in thesacrificial regions. The horizontal layers may be separated into unitsof memory blocks by a first buried insulating layer 141.

The first buried insulating layer 141 may include first portions havinga first depth. The first buried insulating layer 141 may include asecond portion having a second depth lower than the first depth. Thefirst portions of the first buried insulating layer 141 may be formed ina first slit 135A and second slits 135B. The first slit 135A mayseparate the horizontal layers in units of memory blocks. The secondslits 135B may pass through the horizontal layers within a single memoryblock. The first portions of the first buried insulating layer 141 maysupport the horizontal layers. The first slit 135A and the second slits135B may be formed at the same time or substantially the same time. Thesecond portion of the first buried insulating layer 141 may be formed toprevent an electrical connection between the selection line SL and thedummy pattern DP, the selection line SL and the dummy pattern DP beingformed in the same horizontal layer. The second portion of the firstburied insulating layer 141 may be formed in a trench 127A extendingfrom an uppermost horizontal layer, among the horizontal layers, to abottom surface of a target horizontal layer. The target horizontal layermay be the horizontal layer on which the selection line SL and the dummypattern DP are arranged. A depth of the trench 127A may be controlled sothat the trench 127A may not pass through the word line WL.

The selection line SL and the word line WL may extend from a cell region(not illustrated) to the contact region. The selection line SL and thedummy pattern DP may be arranged over the word line WL. The selectionline SL and the dummy pattern DP may be formed on each of two or more ofthe horizontal layers. The dummy pattern DP and the selection line SLarranged on the same horizontal layer may be separated from each otherwith the sacrificial insulating layer 113 and the first buriedinsulating layer 141 interposed therebetween. The dummy pattern DP mayhave a linear shape or substantially a linear shape extending in onedirection. The dummy pattern DP may be separated into two or morepatterns in a direction crossing the extending direction. Thesacrificial insulating layer 113 may be arranged between the two or moredummy patterns DP.

The word line WL may include a first portion P1 and a second portion P2.The first portion P1 may be parallel with or substantially parallel withthe selection line SL. The second portion P2 may be parallel with orsubstantially parallel with the dummy pattern DP. The second portion P2of the word line WL may be extended and coupled to the first portion P1.The second portion P2 of the word line WL may have a linear shape orsubstantially a linear shape extending in one direction. Two or more ofthe second portions P2 of the word line WL may be arranged in thedirection crossing the extending direction. The sacrificial insulatinglayer 113 may be arranged between the two or more second portions P2.The word line WL may be arranged on each of the two or more horizontallayers.

The selection line SL, the dummy pattern DP, and the word line WL maycontact sidewalls of second buried insulating layers 151 passing throughthe horizontal layers, and being extended to the side portions. Theselection line SL, the dummy pattern DP and the word line WL may becoupled to one of the contact plugs CT[11] to CT[mn], and CTsg, where mand n are natural numbers greater than or equal to 2.

The contact plugs CT[11] to CT[mn], and CTsg may include the cellcontact plugs CT[12] to CT[mn] coupled to the word lines WL, the selectcontact plug CTsg coupled to the selection line SL, and the dummycontact plug CT[11] coupled to the dummy pattern DP. The select contactplug CTsg may pass through the sacrificial insulating layer 113 (seeFIG. 2A) arranged between the dummy pattern DP and the selection lineSL. The select contact plug CTsg may be insulated from the dummy contactplug CT[11] through the first buried insulating layer 141. A bottomsurface of each of the contact plugs CT[11] to CT[mn], and CTsg may bearranged on the horizontal layer on which the conductive patterns SL,DP, or WL to contact with is formed.

The contact plugs CT[11] to CT[mn], and CTsg may extend to the targethorizontal layer on which the conductive patterns SL, DP or WL tocontact with is formed. Each of the contact plugs CT[11] to CT[mn], andCTsg may have different cross-sectional areas varying in the z directionshown in FIGS. 2A and 2B. Each of the contact plugs CT[11] to CT[mn],and CTsg may have the largest cross-sectional area at the position atwhich the conductive patterns SL, DP or WL to contact with is arranged.The dummy contact plug CT[11] and the cell contact plugs CT[12] toCT[mn] may be arranged in a matrix format including a plurality of rowsand a plurality of columns. The dummy contact plug CT[11] may passthrough at least one sacrificial insulating layer 113 and be locatedadjacent to the dummy pattern DP. The cell contact plugs CT[12] toCT[mn] may pass through at least one sacrificial insulating layer 113and be adjacent to the second portion P2 of the word line WL.

FIGS. 2A and 2B are cross-sectional views illustrating a representationof a contact region of a semiconductor device according to anembodiment. More specifically, FIG. 2A is a cross-sectional view takenalong line I-I′ of FIG. 1A. FIG. 2B is a cross-sectional view takenalong line II-II′ of FIG. 1A. In FIGS. 2A and 2B, the cell contact plugsnot taken along lines I-I′ and II-II′ are indicated by dotted lines.

As illustrated in FIGS. 2A and 2B, a semiconductor device according toan embodiment may include the interlayer insulating layers 111, andconductive patterns CP[1] to CP[k], where k is a natural number greaterthan or equal to 2. The semiconductor device may also include thesacrificial insulating layers 113, and the contact plugs CTsg and CT[11]to CT[mn]. The interlayer insulating layers 111 may be stacked in afirst direction (z direction) and separated from each other. Theconductive patterns CP[1] to CP[k] and the sacrificial insulating layers113 may be formed in spaces between the interlayer insulating layers111. The sacrificial insulating layers 113 may be arranged at heightswhere the conductive patterns CP[1] to CP[k] are arranged. The contactplugs CTsg and CT[11] to CT[mn] may be coupled to the conductivepatterns CP[1] to CP[k], respectively.

Two or more of the conductive patterns, for example, CP[k−2] to CP[k]from an uppermost conductive pattern, among the conductive patternsCP[1] to CP[k], may be the selection lines SL or the dummy patterns DP.The conductive patterns CP[1] to CP[k−3] formed under the selectionlines SL and the dummy patterns DP may be the word lines WL. Theselection line SL and the dummy pattern DP formed on the same layer maybe separated from each other.

The contact plugs CT[11] to CT[mn], and CTsg may include the cellcontact plugs CT[12] to CT[mn] coupled to the word lines WL, the selectcontact plug CTsg coupled to the selection lines SL, and the dummycontact plug CT[11] coupled to the dummy pattern DP. As illustratedabove in FIG. 1A, the dummy contact plug CT[11] and the cell contactplugs CT[12] to CT[mn] may be arranged in a matrix format. The dummycontact plug CT[11] may be arranged in the first row and column of thematrix. The cell contact plugs CT[12] to CT[mn] may increase in depthgoing away from the dummy contact plug CT[11]. In other words the cellcontact plugs CT[12] to CT[mn] may increase in depth the further thecontact plugs CT[12] to CT[mn] are located away from the dummy contactplug CT[11]. The cell contact plugs CT[12] to CT[mn] may be sequentiallyarranged with a first depth difference D1 in a row direction (xdirection) and sequentially arranged with a second depth difference D2greater than the first depth difference D1 in a column direction (ydirection).

Each of the cell contact plugs CT[12] to CT[mn] may include a firstpillar portion A. Each of the cell contact plugs CT[12] to CT[mn] mayinclude a first protruding portion B protruding from a sidewall of thefirst pillar portion A. The first pillar portion A may pass through oneor more interlayer insulating layers 111 and one or more sacrificialinsulating layers 113 in the first direction (z direction) and extend tothe target word line WL. The first protruding portion B may protrudefrom the sidewall of the first pillar portion A in the horizontal layeron which the target word line WL is formed, and contact a sidewall ofthe target word line WL. The number of cell contact plugs CT[12] toCT[mn], for example, may be the same as the number of stacked word linesWL. The cell contact plugs CT[12] to CT[mn] may have different depthsand be coupled to the word lines WL, respectively.

The select contact plug CTsg may be coupled to the selection lines SLarranged on two or more of the horizontal layers. The select contactplug CTsg may include a second pillar portion C extending in the firstdirection (z direction) and two or more second protruding portions Dprotruding from a sidewall of the second pillar portion C. The secondpillar portion C may pass through one or more of the interlayerinsulating layers 111 and one or more of the sacrificial insulatinglayers 113 and extend to the layer on which the lowermost selection lineis arranged, for example, the layer on which the selection line CP[k−2]is arranged. The second protruding portions D may protrude from thesidewall of the second pillar portion in the layers on which theselection lines SL are formed, and contact sidewalls of the selectionlines SL. The number of second protruding portions D may be, forexample, the same as the number of stacked selection lines SL.

The dummy contact plug CT[11] may be coupled to the dummy pattern DPformed on the layer on which the lowermost selection line is arranged(for example, the layer in which the selection line CP[k−2] isarranged). The dummy contact plug CT[11] may include a third pillarportion E extending in the first direction (z direction) and a thirdprotruding portion F protruding from a sidewall of the third pillarportion E. The third pillar portion E may pass through one or moreinterlayer insulating layers 111 and one or more sacrificial insulatinglayers 113 and extend to the layer on which the lowermost selection lineis arranged (for example, the layer in which the selection line CP[k−2]is arranged). The third protruding portion F may protrude from thesidewall of the third pillar portion E in the layer on which the targetdummy pattern DP is formed, and contact a sidewall of the target dummypattern DP. The third protruding portion F may contact a sidewall of thelowermost dummy pattern among the dummy patterns DP stacked in the firstdirection (z direction).

Each of the dummy contact plug CT[11] and the cell contact plugs CT[12]to CT[mn] may be surrounded by a spacer insulating layer 181. In orderto prevent protruding portions from being formed in another layer otherthan the target layer, the spacer insulating layer 181 may surround onlythe sidewall of the first pillar portion A above the first protrudingportion B or only the sidewall of the third pillar portion E above thethird protruding portion F. In other words, the first protruding portionB or the third protruding portion F may not be surrounded by the spacerinsulating layer 181.

A trench 127A may pass through one or more of the interlayer insulatinglayers 111 and one or more sacrificial insulating layers 113. The trench127A may be formed between the select contact plug CTsg and the dummycontact plug CT[11]. The trench 127A may be filled with the first buriedinsulating layer 141. The depth of the trench 127A may be controlled bythe distance from the uppermost layer of the interlayer insulatinglayers 111 and the sacrificial insulating layers 113, which arealternately stacked with each other, to the horizontal layer on whichthe lowermost selection line is arranged (for example, the horizontallayer on which the selection line CP[k−2] is arranged) so that thetrench 127A may not pass through the word line WL.

A first slit 135A, a second slit 135B, and a third slit 147 may passthrough the interlayer insulating layers 111 and the sacrificialinsulating layers 113 stacked alternately with each other. The firstslit 135A and the second slit 135B may be filled with the first buriedinsulating layer 141. The third slit 147 may be filled with the secondburied insulating layer 151. The conductive patterns CP[1] to CP[k] maycontact a sidewall of the second buried insulating layer 151 and have apredetermined width extending from the sidewall of the second buriedinsulating layer 151. The second slits 135B may be formed between theneighboring cell contact plugs CT[12] to CT[mn] to prevent the cellcontact plugs CT[12] to CT[mn] from being coupled to each other.

A lower structure of the word lines WL may vary depending on a cellstructure formed in a cell region.

According to an embodiment, one of the contact plugs CTsg or CT[11] toCT[mn] may include the protruding portion B, D, or F protruding from thesidewall of the pillar portion A, C or E. The protruding portion B, D,or F may be extended and coupled to a sidewall of the target conductivepattern, i.e., one of the conductive patterns CP[1] to CP[k]. Thus,according to an embodiment, even when the conductive patterns CP[1] toCP[k] are not formed to have a stepped structure, one of the contactplugs CTsg or CT[11] to CT[mn] may be coupled to the target conductivepattern, i.e., one of the conductive patterns CP[1] to CP[k]. Accordingto an embodiment, since the conductive patterns CP[1] to CP[k] are notnecessarily patterned in a stepwise manner, processes may be simplified,and process stability may be increased. According to an embodiment, thearea occupied by the stepped structure may be removed, so that the sizeof the semiconductor device may be reduced.

FIG. 3 is a cross-sectional view illustrating a representation of aperipheral region of a semiconductor device according to an embodiment.Peripheral transistors forming circuits for driving memory cells may bearranged in the peripheral region. FIG. 3 illustrates a portion of theperipheral region in which a single peripheral transistor is formed forconvenience of explanation.

Referring to FIG. 3, in the peripheral region, the interlayer insulatinglayers 111 and the sacrificial insulating layers 113 extending from thecontact region and the cell region may be alternately stacked over thesubstrate 101. A peripheral transistor may be arranged under a stackedstructure including the interlayer insulating layers 111 and thesacrificial insulating layers 113. The peripheral transistor may includea gate 107 formed over a substrate 101 with a gate insulating layer 103interposed therebetween, and a source region 105S and a drain region105D formed in the substrate 101 at both sides of the gate 107. A lowerinsulating layer 109 may be formed under the stacked structure of theinterlayer insulating layers 111 and the sacrificial insulating layers113.

The gate 107, the source region 105S, and the drain region 105D may becoupled to peripheral contact plugs CTg, CTs, and CTd, respectively, andreceive signals from an external device. The peripheral contact plugsCTg, CTs and CTd may pass through the interlayer insulating layers 111and the sacrificial insulating layers 113 and extend to surfaces of thegate 107, the source region 105S and the drain region 105D,respectively. Each of the peripheral contact plugs CTg, CTs, and CTd maybe surrounded by the spacer insulating layer 181. A top portion of eachof the peripheral contact plugs CTg, CTs, and CTd higher than the wordlines WL, illustrated in FIG. 2A, may be surrounded by the first buriedinsulating layer 141. The first buried insulating layer 141 formed inthe peripheral region may be formed in each of grooves 127B, 127C, and127D having the same depth or substantially the same depth as the trench127A illustrated in FIG. 2A. The spacer insulating layer 181 and theperipheral contact plugs CTg, CTs, and CTd may pass through the firstburied insulating layers 141 formed in the grooves 127B, 127C, and 127D.

According to an embodiment, the interlayer insulating layers 111 and thesacrificial insulating layers 113 stacked alternately with each othermay remain in the peripheral region. Therefore, a stepped portion may beprevented from being formed between the peripheral region, the cellregion (not illustrated) and the contact region. As a result, accordingto an embodiment, since a separate process for reducing errors caused bythe stepped portion between the peripheral region, the cell region andthe contact region may not be additionally performed, the processes ofmanufacturing semiconductor devices may be simplified.

FIGS. 4A to 17C are views illustrating a representation of a method ofmanufacturing a semiconductor device according to an embodiment. FIGS.4A, 5A, 6A, 7A, 8A, 9A, 10A, 11A, 12A, 13A and 14A are plan views of acontact region. FIGS. 4B, 6B, 7B, 8B, 9B, 10B, 14B, 15A, 16A and 17A arecross-sectional views taken along line I-I′ of the plan views. FIGS. 5B,6C, 7C, 11B, 12B, 13B, 14C, 15B, 16B and 17B are cross-sectional viewstaken along line II-II′ of the plan views. FIGS. 4C, 5C, 6D, 7D, 8C, 9C,10C, 11C, 12C, 13C, 14D, 15C, 16C and 17C are cross-sectional views of aperipheral region.

Referring to FIGS. 4A to 4C, the peripheral transistor including thegate 107, the source region 105S and the drain region 105D may be formedover the substrate 101. An example of forming the peripheral transistoris described below.

First, the gate insulating layer 103 and at least one gate conductivelayer may be stacked over the substrate 101. Subsequently, the gateconductive layer may be patterned to form the gate 107. Subsequently, inthe peripheral region, impurities may be implanted into thesemiconductor substrate 101 exposed by the gate 107 to form the sourceregion 105S and the drain region 105D. When the gate 107 of theperipheral transistor is formed, a pipe gate may be formed in the cellregion (not illustrated). On the other hand, before the peripheraltransistor is formed, a cell source region may be formed by implantingimpurities into the substrate 101 in the cell region. The process offorming the pipe gate or the cell source region may be selectedaccording to cell structures. Various embodiments of the cell structureswill be described below with reference to FIGS. 19 and 20.

After the peripheral transistor is formed, the lower insulating layer109 may be formed to cover the peripheral transistor. A surface of thelower insulating layer 109 may be planarized.

Subsequently, the interlayer insulating layers 111 and the sacrificialinsulating layers 113 may be alternately stacked over the lowerinsulating layer 109. The number of interlayer insulating layers 111 andthe number sacrificial insulating layers 113 to be stacked may vary. Thesacrificial insulating layers 113 may be formed on the horizontal layerson which conductive patterns are formed. The sacrificial insulatinglayers 113 may be formed of a different material from the interlayerinsulating layers 111. More specifically, the sacrificial insulatinglayers 113 may include a material having an etch selectivity withrespect to the interlayer insulating layers 111. For example, theinterlayer insulating layers 111 may include an oxide layer, and thesacrificial insulating layers 113 may include a nitride layer having anetch selectivity with respect to the oxide layer. The thicknesses of theinterlayer insulating layers 111 and the sacrificial insulating layers113 may vary. For example, the thickness of the sacrificial insulatinglayers in which selection lines are arranged may be greater than that ofthe sacrificial insulating layers in which word lines are arranged. Inaddition, the thickness of the interlayer insulating layers arrangedwith the selection lines interposed therebetween may be greater thanthat of the remaining interlayer insulating layers.

A dummy mask pattern 125 may be formed over the stacked structureincluding the interlayer insulating layers 111 and the sacrificialinsulating layers 113 to open regions in which the trench 127A and thefirst, second and third grooves 127B, 127C, and 127D are formed. Thedummy mask pattern 125 may be a photoresist pattern.

Subsequently, the interlayer insulating layers 111 and the sacrificialinsulating layers 113 may be etched using the dummy mask pattern 125 asan etch barrier until a target sacrificial insulating layer T, among thesacrificial insulating layers 113, is removed. As a result, the trench127A may be formed in the contact region, and the first to third grooves127B, 127C, and 127D may be formed in the peripheral region. The targetsacrificial insulating layer T may be arranged under the uppermostsacrificial insulating layer, among the sacrificial insulating layers113. The position of the target sacrificial insulating layer T maychange depending on the number of selection lines to be stacked. Forexample, when three selection lines are stacked, the target sacrificialinsulating layer T may be the third layer from the top of the stackedsacrificial insulating layers 113. The etching process of forming thetrench 127A and the first to third grooves 127B, 127C, and 127D may becontrolled so that the target sacrificial insulating layer T may beremoved and the sacrificial insulating layer under the targetsacrificial insulating layer T may not be removed.

Though not illustrated in FIGS. 4A to 4C, before the dummy mask pattern125 is formed, a channel layer may be formed in the cell region so thatthe channel layer may pass through the interlayer insulating layers 111and the sacrificial insulating layers 113. The channel layer isdescribed below with reference to FIGS. 19 and 20.

Referring now to FIGS. 5A to 5C, after the dummy mask pattern 125 isremoved, a block mask pattern 131 may be formed to open regions in whichthe first slits 135A and second slits 135B are formed. The block maskpattern 131 may be a photoresist pattern.

Subsequently, using the block mask pattern 131 as an etch barrier, theinterlayer insulating layers 111 and the sacrificial insulating layers113 may be etched. As a result, the first slit 135A and the second slits135B that pass through the interlayer insulating layers 111 and thesacrificial insulating layers 113 may be formed. The first slit 135A mayseparate the interlayer insulating layers 111 and the sacrificialinsulating layers 113 into units of memory blocks. The second slits 135Bmay be separated from each other in a region divided by the first slit135A. The shape and arrangement of the first slit 135A and the secondslits 135B may vary.

Referring to FIGS. 6A to 6D, after the block mask pattern 131 isremoved, the first slit 135A and the second slits 135B may be filledwith the first buried insulating layer 141. The trench 127A and thefirst to third grooves 127B, 127C, and 127D may be filled with the firstburied insulating layer 141. The first buried insulating layer 141 mayinclude an oxide layer.

Subsequently, a recess mask pattern 145 may be formed over the firstburied insulating layer 141 to open a region in which the third slits147 are formed. The recess mask pattern 145 may be a photoresistpattern.

Subsequently, the interlayer insulating layers 111 and the sacrificialinsulating layers 113 may be etched using the recess mask pattern 145 asan etch barrier. As a result, the third slits 147 that pass through theinterlayer insulating layers 111 and the sacrificial insulating layers113 may be formed. The third slits 147 may be formed in the contactregion and the cell region (not illustrated).

Subsequently, the sacrificial insulating layers 113 exposed through thethird slits 147 may be selectively etched to open conductive regions149. The conductive regions 149 may be opened in spaces between theinterlayer insulating layers 111.

Referring now to FIGS. 7A to 7D, the conductive regions 149 may befilled with the conductive patterns CP[1] to CP[k], where k is a naturalnumber greater than or equal to 2. The conductive patterns CP[1] toCP[k] may be formed by filling the conductive regions 149 (see FIG. 6C)with a conductive layer and removing portions of the conductive layerfrom the third slits 147 (see FIG. 6A) so that the conductive layer maybe separated into the conductive patterns CP[1] to CP[k]. The conductivelayer may include at least one of polysilicon, a metal layer and a metalsilicide layer. For example, the metal layer may include a metal havinglower resistance than polysilicon, such as tungsten.

Before the conductive layer is formed, a barrier metal layer (notillustrated) may further be formed on a surface of each of theconductive regions 149 (see FIG. 6C). A portion of the barrier metallayer formed outside each of the conductive regions 149 may be removedby an etching process.

Before the conductive layer or the barrier metal layer is formed, amultilayer film (not illustrated) may be formed on the surface of eachof the conductive regions 149. The multilayer film may include at leastone of a tunnel insulating layer, a data storage layer, and a blockinginsulating layer. The tunnel insulating layer may include, for example,a silicon oxide layer. The data storage layer may include a materiallayer capable of storing charge. For example, the data storage layer mayinclude a polysilicon layer or a silicon nitride layer. The blockinginsulating layer may include at least one of a silicon oxide layer and ahigh dielectric layer having a higher dielectric constant than thesilicon oxide layer. For example, a Al₂O₃ layer may be used as the highdielectric layer. A portion of the multilayer film formed outside eachof the conductive regions 149 may be removed through an etching process.

After the conductive patterns CP[1] to CP[k] are formed, the third slits147 (see FIG. 6A) may be filled with the second buried insulating layer151. The second buried insulating layer 151 may include an oxide layer.

A first contact mask pattern 153 including first opening holes OH[11] toOH[mn], a second opening hole OHsg, and third opening holes OHs, OHg,and OHd may be formed on the second buried insulating layer 151. Thefirst contact mask pattern 153 may include a material having an etchselectivity with respect to the interlayer insulating layers 111 and thesacrificial insulating layers 113. For example, the first contact maskpattern 153 may include polysilicon or TiN. The first contact maskpattern 153 may be formed by sequentially forming a first contact masklayer and a photoresist pattern 155, and then etching the first contactmask layer by using the photoresist pattern 155 as an etch barrier. Thefirst opening holes OH[11] to OH[mn] may open a region in which cellcontact plugs may be formed. A region in which a select contact plug isformed may be opened through the second opening hole OHsg. A region inwhich peripheral contact plugs are formed may be opened through thethird opening holes OHs, OHg, and OHd. The first opening holes OH[11] toOH[mn] may be arranged in a matrix format having m rows and n columns,where m and n are natural numbers greater than or equal to 2. A layoutof the first contact mask pattern 153 may be defined so that the trench127A (see also FIG. 1A) may be aligned between the second opening holeOHsg and the first opening holes OH[11] to OH[mn].

Subsequently, portions of the interlayer insulating layers 111 and thesacrificial insulating layers 113 may be etched by using the firstcontact mask pattern 153 including the first opening holes OH[11] toOH[mn], the second opening hole OHsg and the third opening holes OHs,OHg, and OHd as an etch barrier until a top surface of the targetsacrificial insulating layer T is exposed in the contact region. As aresult, a first contact hole group (1Hsg, 1H[11] to 1H[mn], 1Hs, 1Hg,and 1Hd) may be formed. The first contact hole group may include aselect contact hole 1Hsg, a dummy contact hole 1H[11], first preliminarycell contact holes 1H[12] to 1H[mn] and first preliminary peripheralcontact holes 1Hs, 1Hg, and 1Hd. The select contact hole 1Hsg may beseparated from the dummy contact hole 1H[11] and the first preliminarycell contact holes 1H[12] to 1H[mn] with the trench 127A interposedtherebetween. The dummy contact hole 1H[11] and the first preliminarycell contact holes 1H[12] to 1H[mn] may be arranged in a matrix having mrows and n columns. The dummy contact hole 1H[11] may be arranged in thefirst row and column of the matrix. The first preliminary peripheralcontact holes 1Hs, 1Hg, and 1Hd may pass through the first buriedinsulating layer 141 formed in the first to third grooves 127B, 127C,and 127D and portions of the interlayer insulating layers 111 and thesacrificial insulating layers 113 located under the first buriedinsulating layer 141. Since the first preliminary peripheral contactholes 1Hs, 1Hg, and 1Hd are arranged in the first to third grooves 127B,127C, and 127D formed in the previous processes, the first preliminaryperipheral contact holes 1Hs, 1Hg, and 1Hd may be deeper than the selectcontact hole 1Hsg, the dummy contact hole 1H[11], and the firstpreliminary cell contact holes 1H[12] to 1H[mn]. Therefore, a topsurface of the sacrificial insulating layer arranged under the targetsacrificial insulating layer T may be opened through the firstpreliminary peripheral contact holes 1Hs, 1Hg, and 1Hd.

Referring now to FIGS. 8A to 8C, after the photoresist pattern 155 isremoved (see FIG. 7B), a second contact mask pattern 165A having a firstshape may be formed over the first contact mask pattern 153. The secondcontact mask pattern 165A having the first shape may be a photoresistpattern.

Before the second contact mask pattern 165A having the first shape isformed, a first gap-filling layer 161 may be further formed. The firstgap-filling layer 161 may be formed below the second contact maskpattern 165A. The first gap-filling layer 161 may include a materiallayer having bad step coverage characteristics so that first air gaps163 (or gaps filled with gases except air, or gaps filled with gasesincluding air, or gaps emptied of all gases inside) may be formed in thefirst opening holes OH[11] to OH[mn], the second opening hole OHsg, thethird opening holes OHs, OHg, and OHd, and the first contact hole group(1Hsg, 1H[11] to 1H[mn], 1Hs, 1Hg, and 1Hd). For example, the firstgap-filling layer 161 may include, for example, an amorphous carbonlayer or resin. When the first air gaps 163 are formed in the firstgap-filling layer 161, the first opening holes OH[11] to OH[mn], thesecond opening hole OHsg and the third opening holes OHs, OHg, and OHdmay be more easily opened during a subsequent etching process. However,the first opening holes OH[11] to OH[mn], the second opening hole OHsg,the third opening holes OHs, OHg, and OHd, and the first contact holegroup (1Hsg, 1H[11] to 1H[mn], 1Hs, 1Hg, and 1Hd) may be completelyfilled or substantially completely filled with the first gap-fillinglayer 161 so that air gaps or other gaps (i.e., gaps filled with gasesexcept air, or gaps filled with gases including air, or gaps emptied ofall gases inside) may not be formed in the first gap-filling layer 161.

The second contact mask pattern 165A having the first shape may bepatterned to open the first opening holes OH[1 n] to OH[mn] in an n-thcolumn, among the first opening holes OH[11] to OH[mn], and block thefirst opening holes OH[11] to OH[m(n−1)] in the first to (n−1)-thcolumn. In addition, the second contact mask pattern 165A having thefirst shape may be patterned to block the second opening hole OHsg andopen the third opening holes OHs, OHg, and OHd.

Referring now to FIGS. 9A to 9C, the first gap-filling layer 161, thetarget sacrificial insulating layer T, and the interlayer insulatinglayer under the target sacrificial insulating layer T, among theinterlayer insulating layers 111, which are exposed through the firstopening holes OH[1 n] to OH[mn] in the n-th column, may be etched byusing the second contact mask pattern 165A (see FIG. 8B) having thefirst shape as an etch barrier. In the peripheral region, the firstgap-filling layer 161 (see FIG. 8C), a single interlayer insulatinglayer and a single sacrificial insulating layer, which are exposedthrough the third opening holes OHs, OHg, and OHd, may be etched.

Subsequently, the second contact mask pattern 165A having the firstshape may be etched to form a second contact mask pattern 165B having asecond shape in order to further open the first opening holes OH[1(n−1)]to OH[m(n−1)] in the (n−1)-th column. The second contact mask pattern165B having the second shape may open the first opening holes OH[1 n] toOH[mn] in the n-th column and the first opening holes OH[1(n−1)] toOH[m(n−1)]) in the (n−1)-th column and block the first opening holesOH[11] to OH[m(n−2)]. In addition, the second contact mask pattern 165Bhaving the second shape may block the second opening hole OHsg and openthe third opening holes OHs, OHg, and OHd.

Referring now to FIGS. 10A to 10C, the first gap-filling layer 161, asingle sacrificial insulating layer and a single interlayer insulatinglayer, which are exposed through the first opening holes OH[1 n] toOH[mn] in the n-th column, the first opening holes (OH[1(n−1)] toOH[m(n−1)]) in the (n−1)-th column and the third opening holes OHs, OHg,and OHd, may be etched by using the second contact mask pattern 165B(see FIG. 9B) having the second shape as an etch barrier.

Subsequently, an etching process of the sacrificial insulating layer andthe interlayer insulating layer by using a second contact mask pattern165C having a smaller size than the second contact mask pattern 165B asan etch barrier may be repeated until a second contact hole group(2H[12] to 2H[mn], 2Hs, 2Hg, and 2Hd) is formed.

In other words, the etching process of the sacrificial insulating layersand the interlayer insulating layers by using the second contact maskpattern 165A, 165B or 165C as an etch barrier may be repeated (n−1)times until the second contact hole group (2H[12] to 2H[mn], 2Hs, 2Hg,and 2Hd) is formed. The etching process of reducing the size of thesecond contact mask pattern 165A or 165B may be performed each timebefore the etching process of the sacrificial insulating layers and theinterlayer insulating layers is performed. The etching process forreducing the size of the second contact mask pattern 165A or 165B may beperformed to open another column of the first opening holes OH[11] toOH[mn].

The second contact hole group may include second preliminary cellcontact holes 2H[22] to 2H[mn], second preliminary peripheral contactholes 2Hs, 2Hg, and 2Hd and cell contact holes 2H[12] to 2H[1 n] in thefirst row. The cell contact holes 2H[12] to 2H[1 n] in the first row mayopen the sacrificial insulating layers from the sacrificial insulatinglayer down one layer from the target sacrificial insulating layer T,among the sacrificial insulating layers 113, to the n-th sacrificialinsulating layer from the target sacrificial insulating layer T. Inother words, the cell contact holes 2H[12] to 2H[1 n] in the first rowmay open (n−1) sacrificial insulating layers under the targetsacrificial insulating layer T. The second preliminary cell contactholes 2H[21] to 2H[mn] arranged in the same column as the cell contactholes 2H[12] to 2H[1 n] in the first row may have the same height as thecell contact holes 2H[12] to 2H[1 n] in the first row. The secondpreliminary peripheral contact holes 2Hs, 2Hg, and 2Hd may be deeperthan the second preliminary cell contact holes 2H[22] to 2H[mn]) and thecell contact holes 2H[12] to 2H[1 n] in the first row.

While the second contact hole group (2H[12] to 2H[mn], 2Hs, 2Hg, and2Hd) is formed, the heights of the select contact hole 1Hsg, the dummycontact hole 1H[11], and the first preliminary cell contact holes 1H[21]to 1H[m1] in the first column as described above with reference to FIGS.7A to 7D may be maintained.

Referring now to FIGS. 11A to 11C, after the second contact mask pattern165C (see FIG. 10B) and first gap-filling layer 161 (see FIG. 10B) isremoved, a third contact mask pattern 175A having a first shape may beformed over the first contact mask pattern 153. The third contact maskpattern 175A having the first shape may be a photoresist pattern.

Before the third contact mask pattern 175A having the first shape isformed, a second gap-filling layer 171 may be further formed. The secondgap-filling layer 171 may be formed below the third contact mask pattern175A. The second gap-filling layer 171 may include a material layerhaving bad step coverage characteristics so that second air gaps 173 (orgaps filled with gases except air, or gaps filled with gases includingair, or gaps emptied of all gases inside) may be formed in the firstopening holes OH[11] to OH[mn], the second opening hole OHsg (see FIG.10B) and the third opening holes OHs, OHg, and OHd and the contact holes1Hsg, 1H[11] to 1H[m1], 2H[12] to 2H[mn], 2Hs, 2Hg, and 2Hd formedthereunder. For example, the second gap-filling layer 171 may include,for example, an amorphous carbon layer or resin. When the second airgaps 173 are formed in the second gap-filling layer 171, the firstopening holes OH[11] to OH[mn], the second opening hole OHsg and thethird opening holes OHs, OHg, and OHd may be more easily opened in asubsequent etching process. However, the first opening holes OH[11] toOH[mn], the second opening hole OHsg and the third opening holes OHs,OHg, and OHd and the contact holes 1Hsg, 1H[11] to 1H[m1], 2H[12] to2H[mn], 2Hs, 2Hg, and 2Hd formed thereunder may be completely filled orsubstantially completely filled with the second gap-filling layer 171 soas not to form air gaps or other gaps (i.e., gaps filled with gasesexcept air, or gaps filled with gases including air, or gaps emptied ofall gases inside) therein.

The third contact mask pattern 175A having the first shape may bepatterned to open the first opening holes OH[m1] to OH[mn]) in an m-throw, among the first opening holes OH[11] to OH[mn], and block the firstopening holes OH[11] to OH[(m−1)n] in the remaining first to (m−1)-throws. In addition, the first shape third contact mask pattern 175A mayblock the second opening hole OHsg and open the third opening holes OHs,OHg, and OHd.

Referring now to FIGS. 12A to 12C, the second gap-filling layer 171, minterlayer insulating layers and m sacrificial insulating layers, whichare exposed through the first opening holes OH[m1] to OH[mn] in the m-throw, may be etched by using a second contact mask pattern 175B having afirst shape as an etch barrier. The second gap-filling layer 171 exposedthrough the third opening holes OHs, OHg, and OHd, m interlayerinsulating layers and m sacrificial insulating layers in the peripheralregion may be etched.

Subsequently, a second shape third contact mask pattern 175B may beformed by etching the third contact mask pattern 175A having the firstshape so that the first opening holes (OH[(m−1)1] to OH[(m−1)n] in the(m−1)-th row may be further opened. The third contact mask pattern 175Bhaving a second shape may be patterned to open the first opening holesOH[m1] to OH[mn] in the m-th row and the first opening holes OH[(m−1)1]to OH[(m−1)n] in the (m−1)-th row and block the remaining first openingholes OH[11] to OH[(m−2)n. In addition, the third contact mask pattern175B having the second shape may block the second opening hole OHsg andopen the third opening holes OHs, OHg, and OHd.

Referring now to FIGS. 13A to 13C, the second gap-filling layer 171, msacrificial insulating layers and m interlayer insulating layers, whichare exposed through the first opening holes OH[m1] to OH[mn] in the m-throw, the first opening holes OH[(m−1)1] to OH[(m−1)n] in the (m−1)-throw, and the third opening holes OHs, OHg, and OHd, may be etched byusing the third contact mask pattern 175B (see FIG. 12B) having thesecond shape as an etch barrier.

An etching process of the sacrificial insulating layers and theinterlayer insulating layers may be repeated by using a third contactmask pattern 175C having a smaller size than the second contact maskpattern 175B as an etch barrier until the lowermost sacrificialinsulating layer, among the sacrificial insulating layers 113, isexposed. As a result, a third contact hole group (3H[21] to 3H[mn], 3Hs,3Hg, and 3Hd) may be formed.

In other words, the etching process of the sacrificial insulating layersand the interlayer insulating layers by using the third contact maskpattern 175A, 175B or 175C as an etch barrier may be repeated (m−1)times until the lowermost sacrificial insulating layer, among thesacrificial insulating layers 113, is exposed. An etching process ofreducing the size of the third contact mask pattern 175A or 175B may beperformed each time before the etching process of the sacrificialinsulating layers and the interlayer insulating layers is performed. Theetching process for reducing the size of the third contact mask pattern175A or 175B may be performed to open another row of the first openingholes OH[11] to OH[mn].

The third contact hole group may include cell contact holes 3H[21] to3H[mn] in the second to m-th rows and peripheral contact holes 3Hs, 3Hg,and 3Hd which have different heights. The cell contact holes 3H[21] to3H[mn] in the second to m-th rows may have a greater depth than anddifferent heights from the cell contact holes 2H[12] to 2H[1 n] in thefirst row. The cell contact holes 2H[12] to 2H[1 n], and 3H[21] to3H[mn] may have different heights and open the sacrificial insulatinglayers 113, respectively. The peripheral contact holes 3Hs, 3Hg, and 3Hdmay be deeper than the cell contact holes 2H[12] to 2H[1 n], and 3H[21]to 3H[mn] and open the source region 105S, the gate 107 and the drainregion 105D of the peripheral transistor, respectively.

While the third contact hole group (3H[21] to 3H[mn], 3Hs, 3Hg, and 3Hd)is formed, the heights of the select contact hole 1Hsg and the dummycontact hole 1H[11] as described above with reference to FIGS. 7A to 7Dand the heights of the cell contact holes 2H[12] to 2H[1 n] as describedabove with reference to FIGS. 10A to 10C may be maintained.

As described above, according to an embodiment, the first contact holegroup may be formed by using the first contact mask 153 including theopening holes OHsg, OH[11] to OH[mn], OHs, OHg, and OHd as an etchbarrier. Subsequently, while the first contact mask 153 remains, theetching process of the interlayer insulating layers 111 and thesacrificial insulating layers 113 may be repeated in row and columndirections, so that the contact holes 1Hsg, 1H[11], 2H[12] to 2H[1 n],3H[21] to 3H[mn], 3Hs, 3Hg, and 3Hd having different heights may beformed. According to an embodiment, since the etching process of theinterlayer insulating layers 111 and the sacrificial insulating layers113 is repeated when the first contact mask 153 is not removed, thecontact holes 1Hsg, 1H[11], 2H[12] to 2H[1 n], 3H[21] to 3H[mn], 3Hs,3Hg, and 3Hd may be aligned in regions defined by the opening holesOHsg, OH[11] to OH[mn], OHs, OHg, and OHd. Therefore, according to anembodiment, misalignment of the contact holes 1Hsg, 1H[11], 2H[12] to2H[1 n], 3H[21] to 3H[mn], 3Hs, 3Hg, and 3Hd may be prevented.

Referring now to FIGS. 14A to 14D, the remaining third contact maskpattern 175C (see FIG. 13B) and the remaining second gap-filling layer171 may be removed. Subsequently, the contact holes 1Hsg, 1H[11], 2H[12]to 2H[1 n], 3H[21] to 3H[mn], 3Hs, 3Hg, and 3Hd may be filled with aprotective layer (not illustrated), and an etch-back process may beperformed until the first contact mask pattern 153 (see FIG. 13B) isremoved. The protective layer may be removed after the first contactmask pattern 153 is removed. The protective layer may include, forexample, a photoresist material or an organic material used as a bottomof anti Reflection Coating (BARC) layer. The process of forming theprotective layer may be skipped.

Subsequently, the spacer insulating layers 181 may be formed onsidewalls of the contact holes 1Hsg, 1H[11], 2H[12] to 2H[1 n], 3H[21]to 3H[mn], 3Hs, 3Hg, and 3Hd. The spacer insulating layers 181 may beformed of a different material from the sacrificial insulating layers113, for example, an oxide layer. The spacer insulating layers 181 maybe formed by forming an insulating layer on surfaces of the contactholes 1Hsg, 1H[11], 2H[12] to 2H[1 n], 3H[21] to 3H[mn], 3Hs, 3Hg, and3Hd, and etching the insulating layer so that the sacrificial insulatinglayers 113, the source region 105S, the gate 107 and the drain region105D may be opened through bottom surfaces of the contact holes 1Hsg,1H[11], 2H[12] to 2H[1 n], 3H[21] to 3H[mn], 3Hs, 3Hg, and 3Hd.

Subsequently, a spacer mask pattern 183 may be formed to open the selectcontact hole 1Hsg and block the dummy contact hole 1H[11], the cellcontact holes 2H[12] to 2H[1 n], and 3H[21] to 3H[mn] and the peripheralcontact holes 3Hs, 3Hg, and 3Hd. The spacer mask pattern 183 may be aphotoresist pattern.

Referring now to FIGS. 15A to 15C, the spacer insulating layer 181formed on the sidewall of the select contact hole 1Hsg may be removed byusing the spacer mask pattern 183 (see FIG. 14B) as an etch barrier.After the spacer insulating layer 181 on the sidewall of the selectcontact hole 1Hsg is removed, the spacer mask pattern 183 may removed.As a result, the sacrificial insulating layers 113 from the uppermostsacrificial insulating layer to the target sacrificial insulating layerT may be exposed through the select contact hole 1Hsg.

The spacer insulating layers 181 formed on the sidewalls of the dummycontact hole 1H[11], the cell contact holes 2H[12] to 2H[1 n], and3H[21] to 3H[mn] and the peripheral contact holes 3Hs, 3Hg, and 3Hd mayremain. Each of the dummy contact hole 1H[11] and the cell contact holes2H[12] to 2H[1 n], and 3H[21] to 3H[mn] may open a single sacrificialinsulating layer corresponding thereto.

Referring now to FIGS. 16A to 16 c, the sacrificial insulating layers113 opened through the contact holes 1Hsg, 1H[11], 2H[12] to 2H[1 n],and 3H[21] to 3H[mn] may be selectively etched until the sidewalls ofthe conductive patterns CP[1] to CP[k] are exposed, so that grooves 191may be formed. The first buried insulating layer 141 formed in thetrench 127A, the first slit 135A and the second slits 135B may functionas an etch stop layer. When the sacrificial insulating layers 113include, for example, a nitride layer, the sacrificial insulating layers113 may be selectively etched using, for example, phosphoric acid.

When the sidewalls of the conductive patterns CP[1] to CP[k] aresurrounded by the multilayer film (not illustrated) as described abovewith reference to FIGS. 7A to 7D, an etching process may be performed toremove the multilayer film surrounding the conductive patterns CP[1] toCP[k] after the grooves 191 are formed. The multilayer film may beremoved by using a cleaning solution including, for example, sulfuricacid and de-ionized water (DI).

Two or more of the grooves 191 opening two or more layers of theconductive patterns, for example, CP[k−2] to CP[k] which are used as theselection lines SL, among the conductive patterns CP[1] to CP[k], may becoupled to the select contact hole 1Hsg. The lowermost groove, among thegrooves 191 coupled to the select contact hole 1Hsg, and the groove 191coupled to the bottom surface of the dummy contact hole 1H[11] may beformed in the same layer. The conductive patterns CP[1] to CP[k−3] underthe selection lines SL may be opened through the grooves 191 connectedto the cell contact holes 2H[12] to 2H[1 n], and 3H[21] to 3H[mn]. Asingle groove may be connected to a single cell contact hole.

Referring now to FIGS. 17A to 17C, after the grooves 191 (see FIG. 16B)and the contact holes 1Hsg, 1H[11], 2H[12] to 2H[1 n], 3H[21] to 3H[mn],3Hs, 3Hg, and 3Hd are filled with a conductive material, a surface ofthe conductive material may be planarized until the uppermost interlayerinsulating layer, among the interlayer insulating layers 111, isexposed, so that the contact plugs CTsg, CT[11] to CT[mn], CTs, CTg, andCTd are formed. As the conductive material, one of a polysilicon layer,a metal layer and a metal silicide layer may be used among othermaterials. As the metal layer, tungsten having lower resistance thanpolysilicon may be used among other materials. When a metal layer isformed as the conductive material, a diffusion barrier layer having astacked structure including a barrier metal layer, a Ti layer and a TiNlayer may be further formed before the metal layer is formed.

The contact plugs may include the select contact plug CTsg, the dummycontact plug CT[11], the cell contact plugs CT[12] to CT[mn], and theperipheral contact plugs CTs, CTg, and CTd. The select contact plug CTsgmay be coupled in common to two or more of the conductive patterns, forexample, CP[k−2] to CP[k], which are used as the selection lines SL,among the conductive patterns CP[1] to CP[k]. The dummy contact plugCT[11] may be coupled to the conductive pattern CP[k−2] in the samelayer as the lowermost conductive pattern, among the conductive patternsCP[k−2] to CP[k] which are used as the selection lines SL. The cellcontact plugs CT[12] to CT[mn] may be coupled to the conductive patternsCP[1] to CP[k−3] under the selection lines SL. The peripheral contactplugs CTs, CTg, and CTd may be coupled to the source region 105S, thegate 107 and the drain region 105D of the peripheral transistor,respectively.

According to an embodiment, by selectively etching the sacrificialinsulating layers 113 exposed through the contact holes 1Hsg, 1H[11],2H[12] to 2H[1 n], and 3H[21] to 3H[mn] having different depths, thegrooves 191 may be automatically aligned with the sidewalls of theconductive patterns CP[1] to CP[k] without errors. The contact plugsCTsg and CT[11] to CT[mn] may include protruding portions filling thegrooves 191 automatically aligned with the sidewalls of the conductivepatterns CP[1] to CP[k]. Therefore, the protruding portions of thecontact plugs CTsg and CT[11] to CT[mn] may be automatically alignedwith the sidewalls of the conductive patterns CP[1] to CP[k] withoutalignment errors.

As described above, according to an embodiment, since the processes areperformed so that the contact plugs CTsg and CT[11] to CT[mn] may beautomatically aligned with the sidewalls of the conductive patternsCP[1] to CP[k], alignment of the contact plugs CTsg and CT[11] to CT[mn]may be improved.

FIGS. 18A and 18B are a plan view and a cross-sectional viewillustrating a representation of a contact region of a semiconductordevice according to an embodiment. More specifically, FIG. 18A is a planview illustrating a representation of the contact region, and FIG. 18Bis a cross-sectional view taken along line III-III′ of FIG. 18A.Particularly, FIG. 18A is a plan view illustrating a horizontal layer onwhich the uppermost conductive pattern is arranged.

Referring to FIGS. 18A and 18B, a semiconductor device may includehorizontal layers stacked over a substrate (not illustrated) and havingconductive regions, sacrificial regions. Each of the horizontal layersmay be arranged between interlayer insulating layers 211. Conductivepatterns CP′[1] to CP′[k], where k is a natural number greater or equalto 2, may be formed in the conductive regions. Sacrificial insulatinglayers 213 may be formed in the sacrificial regions. The horizontallayers may be separated into units of memory blocks by a first buriedinsulating layer 241.

The first buried insulating layer 241 may be formed in a first slit 235Aseparating the horizontal layers in units of memory blocks and aplurality of second slits 235B passing through the horizontal layers ina single memory block. The first buried insulating layer 241 may supportthe horizontal layers.

The conductive patterns CP′[1] to CP′[k] may extend from a cell region(not illustrated) to the contact region. The conductive patterns CP′[1]to CP′[k] may include word lines and at least one selection line. Theselection line may be formed over the word lines.

Each of the word lines and the selection line may include a firstportion P1′ and a second portion P2′ extending from the first portionP1′. The first portion P1′ and the second portion P2′ may extend indirections crossing each other. Two or more of the second portions P2′may be arranged in a direction crossing the extending direction. Thesacrificial insulating layer 213 may be arranged between the two or moresecond portions P2′ in the same horizontal layer.

The conductive patterns CP′[1] to CP′[k] may contact sidewalls of secondburied insulating layers 251 passing through the horizontal layers andthe interlayer insulating layers 211 and extend to the sides. Theconductive patterns CP′[1] to CP′[k] may be coupled to the contact plugsCT′[11] to CT′[mn], respectively, where m and n are natural numbersgreater than or equal to 2.

The contact plugs CT[11]′ to CT′[mn] may include select contact plugscoupled to selection lines, respectively, and having different depths,and cell contact plugs coupled to word lines, respectively, and havingdifferent depths. For example, when the selection lines are arranged onthe uppermost conductive pattern CP′[k], among the conductive patternsCP′[1] to CP′[k], and two lower conductive patterns CP′[k−1] andCP′[k−2]), the conductive patterns CP′[k−2] to CP′[k] configured asselection lines may be coupled to the select contact plugs CT′[11] toCT′[13], respectively. In addition, the conductive patterns CP′[1] toCP′[k−3] configured as word lines may be coupled to cell contact plugCT′[14] to CT′[mn], respectively. A lower structure of the conductivepatterns CP′[1] to CP′[k−3] configured as word lines may vary dependingon a cell structure formed in the cell region.

A different cross-sectional area of each of the contact plugs CT′[11] toCT′[mn] may vary along the length of the contact plug. The contact plugsCT[11]′ to CT[mn]′ may have the largest cross-sectional area at a depthat which the target conductive patterns CP′[1] to CP′[k] is arranged,respectively. The contact plugs CT′[11] to CT′[mn] may be arranged in amatrix format including a plurality of rows and a plurality of columns.The contact plugs CT′[11] to CT′[mn] may be sequentially arranged with afirst depth difference in a row direction and with a second depthdifference greater than the first depth difference in a columndirection.

Each of the contact plugs CT′[11] to CT′[mn] may include a pillarportion and a protruding portion protruding from a sidewall of thepillar portion. The pillar portion may pass through the interlayerinsulating layers 211 and the sacrificial insulating layers 213 andextend to a layer in which a target conductive pattern, i.e., one of theconductive patterns CP′[1] to CP′[k] is located. The protruding portionmay protrude from the sidewall of the pillar portion and contact asidewall of the target conductive pattern, i.e., one of the conductivepatterns CP′[1] to CP′[k]. Each of the contact plugs CT′[11] to CT′[mn]may be surrounded by a spacer insulating layer 281. The spacerinsulating layer 281 may surround the pillar portion of each of thecontact plugs CT′[11] to CT′[mn] except for the protruding portionthereof. The spacer insulating layers 281 may surround first pillarportions of the cell contact plug CT′[14] to CT′[mn] and second pillarportions of the select contact plugs CT′[11] to CT′[13].

The semiconductor device illustrated in FIGS. 18A and 18B may be formedby the manufacturing method described above with reference to FIGS. 4Ato 17C. However, since the select contact plugs in the semiconductordevice shown in FIGS. 18A and 18B may be coupled to the selection lines,respectively, the process of forming a trench and the process ofremoving a spacer insulating layer, among the processes described abovewith reference to FIGS. 4A to 17C, may not be performed.

FIGS. 19 and 20 are perspective views illustrating representations ofcell structures of a semiconductor device according to variousembodiments.

An example in which memory cells are arranged along a U-shaped channellayer CH to form a three-dimensional memory string is described belowwith reference to FIG. 19.

As illustrated in FIG. 19, the cell structure may include a pipe gatePG, word lines WL_D and WL_S, at least one source selection line SSL andat least one drain selection line DSL stacked over the substrate SUB.The cell structure may include the U-shaped channel layer CH orsubstantially U-shaped channel layer CH. A multilayer film (notillustrated) including a tunnel insulating layer, a data storage layerand a blocking insulating layer may be formed between the channel layerCH and the word lines WL_D and WL_S. The word lines WL_D and WL_S, thesource selection line SSL and the drain selection line DSL may bepatterns which are coupled to the conductive patterns described withreference to FIGS. 1A to 18B and formed in the cell region.

The channel layer CH may include a pipe channel layer P_CH, and a sourceside channel layer S_CH and a drain side channel layer D_CH protrudingfrom the pipe channel layer P_CH. With reference to FIG. 19, it isdescribed as an example in which a pair of the source side channel layerS_CH and the drain side channel layer D_CH are coupled to the pipechannel layer P_CH. However, two or more source side channels layersS_CH may be coupled to the pipe channel layer P_CH and two or more drainside channel layers D_CH may be coupled to the pipe channel layer P_CHdepending on the shape of the memory string.

The source side channel layer S_CH may pass through the source side wordlines WL_S and the source selection line SSL. The drain side channellayer D_CH may pass through the drain side word lines WL_D and the drainselection line DSL. The source side channel layer S_CH may be coupled tothe source line CSL, and the drain side channel layer D_CH may becoupled to the bit line BL.

According to the semiconductor devices having the above-describedstructure, at least one drain selection transistor, memory cells and atleast one source selection transistor coupled in series with each othermay form a single memory string and be arranged in a U shape orsubstantially U-shape.

The above-described cell structures may be formed by using the processesdescribed above with references to FIGS. 4A to 7D after the pipe gate PGis formed.

Referring to FIG. 20, FIG. 20 may be used to describe examples whereinmemory cells are arranged in a straight type channel layer CH to form athree-dimensional memory string.

Referring now to FIG. 20, a cell structure may include at least onelower selection line LSL, word lines WL and at least one upper selectionline USL stacked over the substrate SUB including a source region. Thecell structure may include the straight type channel layer CH coupled tothe substrate SUB. A multilayer film (not illustrated) including atunnel insulating layer, a data storage layer and a blocking insulatinglayer may be formed between the channel layer CH and the word lines WL.The word lines WL and the upper selection line USL may be patternscoupled to the conductive patterns described above with reference toFIGS. 1A to 18B and formed in cell region. The lower selection line LSLmay be a pattern coupled to at least one conductive lowermost conductivepattern, among the conductive patterns described with reference to FIGS.1A to 18B, and extending to the cell region.

The channel layer CH may be coupled between the substrate SUB and thebit lines BL. Particularly, the channel layer CH may be coupled to thesource region of the substrate SUB.

According to the above-described structure, at least one lower selectiontransistor, memory cells, and at least upper selection transistorcoupled in series with each other may form a single memory string and bearranged in a row.

The above-described cell structure may be formed by using the processesdescribed with reference to FIGS. 4A to 7D.

FIG. 21 is a view illustrating a representation of the configuration ofa memory system according to an embodiment.

As illustrated in FIG. 21, a memory system 1100 according to anembodiment may include a non-volatile memory device 1120 and a memorycontroller 1110.

The non-volatile memory device 1120 of FIG. 21 may include thenon-volatile memory device described with reference to theabove-described embodiments in connection with FIGS. 1A to 20. Inaddition, the non-volatile memory device 1120 may be a multi-chippackage composed of a plurality of flash memory chips.

The memory controller 1110 may be configured to control the non-volatilememory device 1120. The memory controller 1110 may include an SRAM 1111,a CPU 1112, a host interface 1113, an ECC 1114 and a memory interface1115. The SRAM 1111 may function as an operation memory of the CPU 1112.The CPU 1112 may perform a general control operation for data exchangeof the memory controller 1110. The host interface 1113 may include adata exchange protocol of a host being coupled to the memory system1100. In addition, the ECC 1114 may detect and correct errors includedin a data read from the non-volatile memory device 1120. The memoryinterface 1115 may interface with the non-volatile memory device 1120.The memory controller 1110 may further include a ROM that stores codedata to interface with the host.

The memory system 1100 having the above-described configuration may be asolid state disk (SSD) or a memory card in which the memory device 1120and the memory controller 1110 are combined. For example, when thememory system 1100 is an SSD, the memory controller 1110 may communicatewith the outside (e.g., a host) through one of the interface protocolsincluding USB, MMC, PCI-E, SATA, PATA, SCSI, ESDI and IDE.

FIG. 22 is a view illustrating a representation of the configuration ofa computing system according to an embodiment. The memory device 1212 ofFIG. 22 may include the non-volatile memory device described withreference to the above-described embodiments in connection with FIGS. 1Ato 21.

As illustrated in FIG. 22, a computing system 1200 according to anembodiment may include a CPU 1220, RAM 1230, a user interface 1240, amodem 1250 and a memory system 1210 that are electrically coupled to asystem bus 1260. In addition, when the computing system 1200 is a mobiledevice, a battery may be further included to apply an operating voltageto the computing system 1200. The computing system 1200 may furtherinclude application chipsets, a Camera Image Processor (CIS) and amobile DRAM.

As described above with reference to FIG. 21, the memory system 1210 mayinclude a non-volatile memory 1212 and a memory controller 1211.

According to the various embodiments, since contact plugs include pillarportions extending in a direction in which conductive patterns, forexample, word lines are stacked, and protruding portions protruding fromsidewalls of the pillar portions and contacting a sidewall of a targetconductive pattern, the contact plugs may be coupled to sidewalls of theconductive patterns.

According to the various embodiments, alignment of the contact plug maybe improved by automatically aligning a contact plug with a sidewall ofa conductive pattern.

What is claimed is:
 1. A semiconductor device, comprising: interlayerinsulating layers stacked in a first direction and separated from eachother; conductive patterns formed between the interlayer insulatinglayers, wherein edges of the conductive patterns are aligned in thefirst direction; and contact plugs contacting the edges of theconductive patterns.
 2. The semiconductor device of claim 1, wherein theinterlayer insulating layers extend sideways so that spaces are definedbetween extending portions of the interlayer insulating layers.
 3. Thesemiconductor device of claim 2, further comprising: sacrificialinsulating layers formed in the spaces so that the sacrificialinsulating layers are arranged at layers where the conductive patternsare formed.
 4. The semiconductor device of claim 3, wherein each of thecontact plugs includes a protruding portion contacting one of the edgesof the conductive patterns and a pillar portion extending in the firstdirection from the protruding portion, wherein the protruding portionextends to overlap the extending portions of the interlayer insulatinglayers, and wherein the pillar portion passes through at least one theextending portions of the interlayer insulating layers and at least onethe sacrificial insulating layers.
 5. The semiconductor device of claim4, further comprising: a spacer insulating layer formed on theprotruding portion and extending onto a sidewall of the pillar portion.6. The semiconductor device of claim 1, wherein the contact plugsincludes a cell contact plug contacting one of the edges of theconductive patterns and a select contact plug contacting two or more ofthe edges of the conductive patterns.
 7. The semiconductor device ofclaim 6, wherein the cell contact plug is longer than the select contactplug in the first direction.